유건욱 프로필 사진

유건욱

Yoo, Geon wook

IT대학

전자정보공학부 전자공학전공

자료 필터

자료유형

발행연도

2016 ~ 2026
2016 2026

키워드

언어

전체 74건 중 1번부터 10번까지의 결과를 표시합니다.

2026
Article

Demonstration of ferroelectric GaN transistors with area-ratio-controlled AlScN-based MFMIS gate stack

  • 2026-08
  • Applied Physics Letters
  • AIP Publishing
Article

Effect of AlScN Polarization Suppression in the Access-Region for Ferroelectric GaN HEMTs

  • Joo, Hyeong Jun
  • Lee, Gyuhyung
  • Lim, Yoojin
  • Hanrahan, Brendan
  • Yoo, Geonwook
  • 2026-07
  • IEEE Transactions on Electron Devices
  • IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Article

Effects of Dielectric Interlayer on Polarization Switching and Rectifying Characteristics in Al0.8Sc0.2N/HfO2 Ferroelectric Diodes

  • Park, Jong Min
  • Joo, Hyeong Jun
  • Lim, Yoojin
  • Bae, Juno
  • Hanrahan, Brendan
  • ... Yoo, Geonwook
  • 2026-06
  • Micromachines
  • MDPI
Article

Geometric and Area Scaling Effects on Ferroelectric Properties of Al0.8Sc0.2N-Based Capacitive Memory

  • 2026-04
  • IEEE Journal of the Electron Devices Society
  • IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Article

Ferroelectric AlScN Field-Plated Vertical β-Ga2O3 SBD With Improved On-Resistance and Breakdown Voltage

  • Yoon, Sisung
  • Kim, Hyojung
  • Lim, Yoojin
  • Oh, Seungyoon
  • Park, Jongmin
  • ... Yoo, Geonwook
  • 2026-03
  • IEEE Transactions on Electron Devices
  • IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Article

Fast photo-carrier multiplication by engineered potential trap in MoS2/Ge double junction phototransistor

  • Park, Youngseo
  • Jung, Minhyeok
  • Jeong, Han Beom
  • Jeong, Hu Young
  • Sim, Sangwan
  • ... Yoo, Geonwook
  • 외 1명
  • 2026-01
  • Scientific Reports
  • NATURE PORTFOLIO
2025
Article

Rapid Thermal Annealing for Reduced Leakage and Enhanced Endurance of Reactive-Sputtered AlScN-Based Ferroelectric Memory Capacitors

  • Bae, Juno
  • Lim, Yoojin
  • Park, Jong Min
  • Joo, Hyeong Jun
  • Yoo, Geonwook
  • 2025-11
  • ELECTRONICS
  • MDPI
Article

Enhanced Reliability of Ferroelectric GaN HEMTs With Reduced Depolarization-Field Effect

  • Joo, Hyeong Jun
  • Lee, Gyuhyung
  • Lim, Yoojin
  • Hanrahan, Brendan
  • Yoo, Geonwook
  • 2025-10
  • IEEE Electron Device Letters
  • IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Article

Monolithic Integrated, Reconfigurable Gallium Oxide NAND/NOR Gates With Ferroelectric AlScN Gate Stack

  • Yoon, Sisung
  • Oh, Seungyoon
  • Lim, Yoojin
  • Park, Ji-Hyeon
  • Jeon, Dae-Woo
  • ... Yoo, Geonwook
  • 2025-09
  • IEEE Electron Device Letters
  • IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Article

Suppressed Negative DIBL of Ferroelectric HEMT With Gate-Align Patterned AlScN Stack

  • Lee, Gyuhyung
  • Joo, Hyeong Jun
  • Oh, Seung Yoon
  • Yoo, Geonwook
  • 2025-07
  • IEEE Electron Device Letters
  • IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
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