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Temperature-Dependent Ferroelectric Behaviors of AlScN-Based Ferroelectric Capacitors with a Thin HfO2 Interlayer for Improved Endurance and Leakage Current
- Joo, Hyeong Jun;
- Yoon, Si Sung;
- Oh, Seung Yoon;
- Lim, Yoojin;
- Lee, Gyu Hyung;
- ... Yoo, Geonwook
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13초록
The ferroelectric switching behavior of a metal-ferroelectric AlScN-HfO2 interlayer-metal (MFIM) capacitor was investigated at variable temperatures and compared with an MFM capacitor. Although the MFIM capacitor demonstrated an inferior remnant polarization (2P(r) value of 74 mu C/cm(2)), it exhibited a reduced leakage current (x1/100) and higher breakdown field. The MFIM showed a stable change in 2P(r) from room temperature to 200 degrees C and an enhanced endurance of similar to 10(4) cycles at 200 degrees C; moreover, the leakage current was less degraded after the cycling tests. Thus, the ferroelectric AlScN with a thin HfO2 interlayer can enhance the reliability of ferroelectric switching.
키워드
AlScN; ferroelectric capacitor; HfO2 interlayer; endurance; FILMS
- 제목
- Temperature-Dependent Ferroelectric Behaviors of AlScN-Based Ferroelectric Capacitors with a Thin HfO2 Interlayer for Improved Endurance and Leakage Current
- 저자
- Joo, Hyeong Jun; Yoon, Si Sung; Oh, Seung Yoon; Lim, Yoojin; Lee, Gyu Hyung; Yoo, Geonwook
- 발행일
- 2024-11
- 유형
- Article
- 저널명
- ELECTRONICS
- 권
- 13
- 호
- 22
- 언어
- ENG
- 출판사
- MDPI
- 발행국가
- 스위스
- ISSN
- E 2079-9292
P 2079-9292