High-quality GaN films grown on chemical vapor-deposited graphene films

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초록

We report the growth of high-quality GaN films on large-size graphene films for visible light-emitting diodes (LEDs). The graphene films were synthesized by chemical vapor deposition and then transferred onto amorphous silica (SiO2) substrates that do not have an epitaxial relationship with GaN. Before growing the high-quality GaN thin films, ZnO nanowalls were grown on the graphene films as an intermediate layer. The structural and optical characteristics of the GaN films were investigated, and the films exhibited stimulated emission even at room temperature, a highly c-axis-oriented crystal structure, and a preferred in-plane orientation. Visible LEDs that emitted strong electroluminescence under room illumination were fabricated using the GaN thin films. NPG Asia Materials (2012) 4, e24; doi:10.1038/am.2012.45; published online 7 September 2012

키워드

amorphous substrate; gallium nitride; hybrid heterostructure; large-size graphene film; light-emitting diode; LIGHT-EMITTING-DIODES; OPTOELECTRONIC DEVICES; STIMULATED-EMISSION; LAYERS; PHOTOVOLTAICS; BLUE
제목
High-quality GaN films grown on chemical vapor-deposited graphene films
저자
Chung, Kunook; Park, Suk In; Baek, Hyeonjun; Chung, Jin-Seok; Yi, Gyu-Chul
DOI
10.1038/am.2012.45
발행일
2012-09
유형
Article
저널명
NPG Asia Materials
권
4