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Observation of enhanced negative hydrogen ion production in weakly magnetized RF plasma
- Wang, SJ;
- Kwak, JG;
- Kim, CB;
- Kim, SK
Citations
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17Citations
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25초록
Negative hydrogen ion concentration is measured during the afterglow of an axially magnetized, pulsed RF plasma source utilizing photodetachment technique. Observed negative hydrogen ion density peaks sharply around B-0 = 10 similar to 20 G and is about four times larger than that of non-magnetized plasmas. This enhancement strongly correlates to corresponding peaking in electron density. (C) 2003 Elsevier B.V. All rights reserved.
키워드
negative hydrogen ion; RF magnetized plasma; plasma source; photodetachment; DISCHARGES; FREQUENCY; WAVES
- 제목
- Observation of enhanced negative hydrogen ion production in weakly magnetized RF plasma
- 저자
- Wang, SJ; Kwak, JG; Kim, CB; Kim, SK
- 발행일
- 2003-07
- 유형
- Article
- 권
- 313
- 호
- 4
- 페이지
- 278 ~ 283
- 언어
- ENG
- 출판사
- ELSEVIER SCIENCE BV
- 발행국가
- 네덜란드
- 분량
- 6 페이지
- ISSN
- P 0375-9601